SiC Process
Chemical Vapor Deposition (CVD) uses gaseous components as precursors to a chemical reaction forming an intrinsically pure solid. The process takes place at elevated temperatures and reduced pressures, typically on Graphite surfaces. This slow and deliberate process demands about a week to yield a batch of Pyrolytic Boron Nitride materials.
Our furnaces maintain temperatures as high as 2000 C for up to 10 days. To add to the challenge, they sustain interior pressures of less than half a torr with variations of no more than a millitorr throughout the deposition cycle.
The CVD process produces a highly uniform coating, creating shapes nearly identical to the mold, reducing manufacturing costs and delivering end products made to tighter specifications.
